SYSTEMS AND METHODS FOR CLEANING A CHAMBER WINDOW OF AN EUV LIGHT SOURCE
摘要
<p>Systems and methods are disclosed for cleaning a chamber window of an extreme ultraviolet (EUV) light source. The window may have an inside surface facing a chamber interior and an opposed outside surface and the light source may generate debris by plasma formation. For the system, a subsystem may be positioned outside the chamber and may be operable to pass energy through the window to heat debris accumulating on the inside surface of the window. In a first embodiment, the subsystem may place a flowing, heated gas in contact with the outside surface of the window. In another embodiment, electromagnetic radiation may be passed through the window.</p>
申请公布号
WO2006093780(A2)
申请公布日期
2006.09.08
申请号
WO2006US06407
申请日期
2006.02.24
申请人
CYMER, INC.;BYKANOV, ALEXANDER, N.;MARX, WILLIAM, F.