HIGH ETCH RESISTANT HARDMASK COMPOSITION HAVING ANTIREFLECTIVE PROPERTY AND PROCESS OF PRODUCING PATTERNED MATERIALS BY USING THE SAME

摘要

A copolymer containing an aromatic ring, an antireflective hard mask composition containing the copolymer, and a method for forming a patterned shape on a substrate by using the composition are provided to improve optical properties, mechanical properties and etching selectivity. A copolymer containing an aromatic ring is represented by the formula 1 or 2, wherein l, m and n are an integer of 1-190; R1 is H, OH, a C1-C10 alkyl group, a C6-C10 aryl group, an allyl group or a halogen atom; R2 is -CH2-, -H2C-Ph-CH2-, -H2C-Ph-Ph-CH2-, -C(OH-substituted Ph)H-, or -C(Ph)H-; R3 is a conjugated diene; and R4 is an unsaturated dienophile. An antireflective hard mask composition comprises 1-25 wt% of the copolymer; and 75-99 wt% of an organic solvent.