发明名称 Fotopolymerisierbarer Lack und dessen Verwendung zur Erzeugung eines Reliefbildes
摘要 <p>In a photopolymerisable varnish, containing one or more photopolymerisable compounds, initiators and solvents, the photopolymerisable compound has the formula B (Ar(NO2)m)n, where B is a high-molecular weight organic compounds, in particular a (co)polymer, with a (possibly branched) long chain, which may carry (non)functional groups which do not react. with the nitro groups, and in which some of the carbon atoms may be replaced by oxygen, nitrogen or sulphur; Ar is a group of 1-4 separate or condensed benzene rings, possibly carrying (non)functional groups which do not react with the nitro groups, or possibly being condensed with 1 or two heterocyclic groups, these aryl groups being bonded by covalence to a carbon, oxygen, nitrogen or sulphur atom of the main chain or a side chain of compound B; m is an integer from 1 to 6; n is an integer m.</p>
申请公布号 CH506807(A) 申请公布日期 1971.04.30
申请号 CH19680007329 申请日期 1968.05.17
申请人 VEB FILMFABRIK WOLFEN 发明人 PIETSCH,HERWARD,DR.;RABE,CHARLOTTE,DR.;BAUMBACH,WOLFGANG;KUHNERT,LOTHAR
分类号 C08F2/46;C08F8/00;C08F8/30;G03F7/038;(IPC1-7):G03C1/70;G03F7/08 主分类号 C08F2/46
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