| 发明名称 |
DEVELOPER AND PATTERNING PROCESS USING THE SAME |
| 摘要 |
The present invention provides a developer for a photosensitive resist composition, comprising a compound represented by the general formula (1);;wherein R1 to R6 represent a linear, branched, or cyclic alkyl group having 1 to 4 carbon atoms; and X represents a linear or branched alkylene group having 6 to 16 carbon atoms and optionally having an ester group. There can be provided a developer that can prevent the occurrence of pattern collapse and connection between patterns, i.e. bridge defect after development and can provide a resist pattern with small edge roughness. |
| 申请公布号 |
US2016195813(A1) |
申请公布日期 |
2016.07.07 |
| 申请号 |
US201514949418 |
申请日期 |
2015.11.23 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
HATAKEYAMA Jun |
| 分类号 |
G03F7/32;C07C229/24;C07C211/63;G03F7/20;G03F7/16 |
主分类号 |
G03F7/32 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A developer for a photosensitive resist composition, comprising a compound represented by the general formula (1)wherein R1 to R6 represent a linear, branched, or cyclic alkyl group having 1 to 4 carbon atoms; and X represents a linear or branched alkylene group having 6 to 16 carbon atoms and optionally having an ester group. |
| 地址 |
Tokyo JP |
