发明名称 SUBSTRATE HOLDER, METHOD FOR HOLDING SUBSTRATE WITH SUBSTRATE HOLDER, AND PLATING DEVICE
摘要 PROBLEM TO BE SOLVED: To reduce a thickness of a plating film of a die located adjacent to a portion where a pattern is not formed in a resist to improve the film thickness uniformity on a substrate surface.SOLUTION: A substrate holder according to the invention includes: a holding surface 57 for holding a substrate; a second holding member 60 which has an opening part 63 for exposing the holding surface 57 and is configured to press the substrate placed on the holding surface 57 against the holding surface 57 to hold the substrate; and a shield plate 65 which protrudes to the radial inner side of the opening part 63 of the second holding member 60 and shields a part of the substrate. The shield plate 65 is configured so as to move along the opening part 63.SELECTED DRAWING: Figure 2
申请公布号 JP2016127069(A) 申请公布日期 2016.07.11
申请号 JP20140265211 申请日期 2014.12.26
申请人 EBARA CORP 发明人 NAGAI MIZUKI;SHIMOYAMA TADASHI
分类号 H01L21/683;C25D5/02 主分类号 H01L21/683
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