Manufacturing method for photomask

摘要

A manufacturing method for a photomask for wafer processing includes a step of forming a groove on the front side of a light shielding plate in an area where light is to be passed. The groove has a depth not reaching the back side of the light shielding plate. A uniting step applies a bonding agent capable of transmitting light to the front side of the light shielding plate after performing the groove forming step and next attaching a transparent plate through the bonding agent to the front side of the light shielding plate to thereby unite the light shielding plate and the transparent plate. A grinding step holds the transparent plate on a chuck table after performing the uniting step. The back side of the light shielding plate is ground until the groove is exposed to the back side of the light shielding plate.

主权项

1. A manufacturing method for a photomask for wafer processing, comprising:
a preparing step of preparing a transparent plate for transmitting light and a light shielding plate for shielding light, each of said transparent plate and said light shielding plate having a size equal to or greater than that of a wafer to be processed; a groove forming step of forming a groove on a front side of said light shielding plate in an area where light is to be passed, said groove having a depth not reaching a back side of said light shielding plate; a uniting step of applying a bonding agent capable of transmitting light to the front side of said light shielding plate after performing said groove forming step and next attaching said transparent plate through said bonding agent to the front side of said light shielding plate to thereby unite said light shielding plate and said transparent plate; and a grinding step of holding said transparent plate on a chuck table after performing said uniting step and next grinding the back side of said light shielding plate until said groove is exposed to the back side of said light shielding plate.