主权项 |
1. A method for partial detachment, using a laser beam, of a defined area of a conductive layer supported by an underlying substrate, the method comprising:
forming a conductor track, completely within the defined area, with a defined path from a portion of the conductive layer supported by the underlying substrate, the path defining main axes (X, Y); providing a plurality of linear recesses, by a laser directly applied to the conductive layer, extending, in a direction that is not parallel to either of the main axes (X, Y), and excluding respective end regions of the plurality of linear recesses, in a direction that is aligned at an acute angle with respect to edges of the conductor track, from at least one of an edge of the defined area or an edge of the conductor track to at least one of another edge of the defined area or another edge of the conductor track,
wherein providing the plurality of linear recesses segments the defined area into a plurality of zones to be removed, each zone to be removed extending from at least one of an edge of the defined area or an edge of the conductor track to at least one of another edge of the defined area or another edge of the conductor track,wherein each of the plurality of linear recesses defines a portion of a perimeter of at least one of a plurality of strip-shaped zones to be removed and,wherein each of the plurality of linear recesses thermally insulates an outer edge region of at least one of the plurality of strip-shaped zones to be removed from adjoining ones of the plurality of strip-shaped zones to be removed; and heating a portion of a first of the zones to be removed using laser radiation provided by a laser beam until adhesion of the conductive layer to the underlying substrate is substantially reduced and the portion can be detached in a surface-wide manner from the underlying substrate under external influences, wherein laser-beam parameters of the laser beam providing the laser radiation are set such that the conductive layer can be detached without affecting the underlying substrate. |