发明名称 SYSTEM LEVEL POWER DELIVERY TO PLASMA PROCESSING LOAD
摘要 PROBLEM TO BE SOLVED: To provide system level power delivery to a plasma processing load.SOLUTION: The present disclosure discusses a power delivery system, and a method of operation, configured to monitor characteristics of a generator, a match network, and a plasma load, via one or more sensors, and control these components via a local controller in order to improve power delivery accuracy and consistency to the plasma load. Control can be based on a unified monitoring of power characteristics in the power delivery system and variations between the components and even non-electrical characteristics such as plasma density, an end point, and spectral components of plasma light emission, to name a few.SELECTED DRAWING: Figure 2A
申请公布号 JP2016149366(A) 申请公布日期 2016.08.18
申请号 JP20160053392 申请日期 2016.03.17
申请人 ADVANCED ENERG IND INC 发明人 THOMAS JOEL BLACKBURN;THOMAS MCINTYRE;FERNANDO GUSTAVO TOMASEL
分类号 H05H1/46;H01L21/3065 主分类号 H05H1/46
代理机构 代理人
主权项
地址