ELECTROSTATIC CHUCK ASSEMBLY AND PLASMA PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To improve uniformity of electric flux above a workpiece during a plasma processing process.SOLUTION: An electrostatic chuck assembly 100 having a dielectric material 108 and/or having a cavity 106 with varying thickness, profile and/or shape includes a conductive support 102 and an electrostatic chuck ceramic layer 104. A dielectric layer or insert 108 is located between the conductive support 102 and an electrostatic chuck ceramic layer 104. A cavity 106 is located in a seating surface of the electrostatic chuck ceramic layer 104. An embedded pole pattern can be optionally incorporated in the electrostatic chuck assembly.SELECTED DRAWING: Figure 1