| 摘要 |
PURPOSE:To eliminate the influence of a warp of a semiconductor wafer by attracting and holding the wafer on an electrostatic attracting device having a pair of electrodes and exposing the wafer in this state. CONSTITUTION:A semiconductor wafer 1 formed with a resist 8 and an SiO2 7 is placed on an electrostatic attracting device having a pair of electrodes 3, 4 isloated and insulated from each other via an insulator 2, is then attracted and held, and is exposed in the state that the warp of the wafer is eliminated by utilizing a mask 9. Since the warp of the wafer can be eliminated in this manner, the wafer of a high resolution having no displacement of focus and position can be obtained. |
