发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURE THEREOF
摘要 PURPOSE:To easily form a Schottky FET which can endure high temperature and has a large contact potential by forming a Schottky contact of a specific material. CONSTITUTION:A Sohottky contact 12' which becomes a gate electrode is formed of W-Si-Ge of Si-Ge having W of high melting point metal on an N-type GaAs substrate 11, and a Ti-Au electrode 15 for facilitating a bonding is formed thereon. With the Schottky electrode as a mask a source and a drain are formed in a self-aligning manner. Then, a Schottky FET which can endure a high temperature and has a large contact potential can be easily formed.
申请公布号 JPS6396965(A) 申请公布日期 1988.04.27
申请号 JP19860243427 申请日期 1986.10.14
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 KONUMA TAKESHI
分类号 H01L29/872;H01L21/338;H01L29/47;H01L29/812 主分类号 H01L29/872
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