发明名称 |
SEMICONDUCTOR DEVICE AND MANUFACTURE THEREOF |
摘要 |
PURPOSE:To easily form a Schottky FET which can endure high temperature and has a large contact potential by forming a Schottky contact of a specific material. CONSTITUTION:A Sohottky contact 12' which becomes a gate electrode is formed of W-Si-Ge of Si-Ge having W of high melting point metal on an N-type GaAs substrate 11, and a Ti-Au electrode 15 for facilitating a bonding is formed thereon. With the Schottky electrode as a mask a source and a drain are formed in a self-aligning manner. Then, a Schottky FET which can endure a high temperature and has a large contact potential can be easily formed. |
申请公布号 |
JPS6396965(A) |
申请公布日期 |
1988.04.27 |
申请号 |
JP19860243427 |
申请日期 |
1986.10.14 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
KONUMA TAKESHI |
分类号 |
H01L29/872;H01L21/338;H01L29/47;H01L29/812 |
主分类号 |
H01L29/872 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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