Process for coating a tool base, and tool produced by this process

摘要

Particularly for reducing the high coating temperatures and for improving the adhesion of the surface layer, it is proposed to use a plasma-activated CVD process with a pulsed direct voltage and a residual voltage, remaining in the pulse process, of a magnitude which is equal to or greater than the lowest ionisation potential of the gases participating in the CVD process, but is at most 50% of the maximum value of the pulsed direct voltage. The thickness of the layers should be at most 20 to 30 mu m, the base temperature during the coating being between 400 and 800 or preferably below 600@C.