发明名称 LASER BEAM MARKING SYSTEM
摘要 PURPOSE:To make marking work efficiently without using large-sized laser beam oscillator by changing laser beam irradiating position during charging or setting and irradiating the laser beam onto a material to be machined in one shot at the same time of completion of the change. CONSTITUTION:During charging time and reversing time, shift of X-axis movable base 15 or Y-axis movable base 17 is completed from a first zone to a second zone. When the shift of mirror movable base completes during charging or reversing, as the pulse laser beam can be immediately irradiated, a pattern in formation can be efficiently marked onto the material 11 to be worked. By this method, the marking, which can mark onto the material to be machined in one shot, is marked at plural times, and the marking having large area can be efficiently completed.
申请公布号 JPH03248784(A) 申请公布日期 1991.11.06
申请号 JP19900045422 申请日期 1990.02.28
申请人 HITACHI LTD 发明人 OKUMURA KIYOSHI;NISHIMURA KAZUMAGO;OKAWA HIROO;MERA KAZUO;SHIONO SHIGEO;FUJIMOTO MINORU
分类号 B23K26/00;B23K26/06 主分类号 B23K26/00
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