| 摘要 |
PURPOSE:To provide a zinc oxide sintered compact useful as a sputtering target. CONSTITUTION:This crystalporiented zinc oxide sintered compact has 3.5-5.8 g/cm<3> density and the orientation ratio of (100) crystal orientation is within the range represented by the inequality, wherein I (100) is the integrated intensity of an X-ray diffraction peak showing (100) face, I (002) is the integrated intensity of an X-ray diffraction peak showing (002) face and I (101) is the integrated intensity of an X-ray diffraction peak showing (101) face. When this sintered compact is used as a target, a low resistance film is formed on a substrate opposite and parallel to the target over a wide range. |
