发明名称 DEVICE AND PROCESS FOR TREATING SUBSTRATES IN FLUID CONTAINER
摘要 PURPOSE: A device and a process for treating substrates are provided in which the substrates can be particularly easily and securely treated and handled. CONSTITUTION: In a device for treating a substrate (3) in a fluid container (1) with a transport device (5) which can be moved above the fluid container, the transport device has a substrate holder (6) which secures the substrates in a first position and releases them in a second position. In the first position, a securing protrusion(11) of a securing rod(7) having rectangular sectional shape extends into the transport device. In the second position, the rod rotates by 90 degree about an axis(8), and longitudinal side of the rod are in the same height with a side wall of the transport device, the substrates being thus dropped into the fluid container.
申请公布号 KR20000010552(A) 申请公布日期 2000.02.15
申请号 KR19987008400 申请日期 1998.10.20
申请人 STEAG MICROTECH GMBH 发明人 WEBER, MARTIN;MEURIS, MARC;CORNELISSEN, INGRID
分类号 B65G49/04;B65G49/07;H01L21/00;H01L21/304;H01L21/673;(IPC1-7):H01L21/00 主分类号 B65G49/04
代理机构 代理人
主权项
地址