MULTI-ZONE ILLUMINATOR WITH EMBEDDED PROCESS CONTROL SENSORS

摘要

PURPOSE: A multi-zone illuminator is provided to allow uniform wafer heating during both transient and steady-state wafer heating cycles by using an embedded process control sensor. CONSTITUTION: A multi-zone illuminator(130) for processing semiconductor wafers comprises a plurality of source lamps(220) and dummy lamps(222) embedded in a reflector side of a lamp housing(200). The source lamps(220) are arranged in a plurality of concentric circular zones. The illuminator also comprises a plurality of light pipes(210) for receiving multi-point temperature sensors to measure the semiconductor wafer temperature and its distribution uniformity. A gold-plated reflector plate(230) is attached to the bottom side of the lamp housing for reflecting and directing optical energy toward the wafer surface. The distance between the reflector plate and the wafer and the lamps and the wafer may be adjusted with the use of a spacial elevator and adaptor assembly.