发明名称 A semiconductor device having a drift region
摘要 A semiconductor device having a first conductive type drain region (29) and a drift region comprising plural first conductive type drift path regions (1) which are alternate with second conductive type compartment regions (2). A second conductive type well (27) is located at the opposite end of the drift region and extends over a plurality of the p-n junctions (jb) which are formed between the drift path regions and compartment regions.
申请公布号 GB2355584(A) 申请公布日期 2001.04.25
申请号 GB20010001027 申请日期 1997.01.21
申请人 * FUJI ELECTRIC CO LTD 发明人 TATSUHIKO * FUJIHIRA
分类号 H01L29/06;H01L29/08;H01L29/10;H01L29/739;H01L29/78;H01L29/786;H01L29/808;H01L29/812;(IPC1-7):H01L29/06;H01L29/66 主分类号 H01L29/06
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