发明名称 |
A semiconductor device having a drift region |
摘要 |
A semiconductor device having a first conductive type drain region (29) and a drift region comprising plural first conductive type drift path regions (1) which are alternate with second conductive type compartment regions (2). A second conductive type well (27) is located at the opposite end of the drift region and extends over a plurality of the p-n junctions (jb) which are formed between the drift path regions and compartment regions. |
申请公布号 |
GB2355584(A) |
申请公布日期 |
2001.04.25 |
申请号 |
GB20010001027 |
申请日期 |
1997.01.21 |
申请人 |
* FUJI ELECTRIC CO LTD |
发明人 |
TATSUHIKO * FUJIHIRA |
分类号 |
H01L29/06;H01L29/08;H01L29/10;H01L29/739;H01L29/78;H01L29/786;H01L29/808;H01L29/812;(IPC1-7):H01L29/06;H01L29/66 |
主分类号 |
H01L29/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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