发明名称 |
Method of manufacturing a semiconductor structure with treatment to sacrificial stop layer producing diffusion to an adjacent low-k dielectric layer lowering the constant |
摘要 |
A method of manufacturing a low-k semiconductor structure including the steps of forming a low-k dielectric layer, forming a sacrificial etch stop layer adjacent the low-k dielectric layer, and applying energy to the sacrificial etch stop layer to diffuse a component of the sacrificial etch stop layer into the adjacent low-k dielectric layer. This diffusion of the component lowers the dielectric constant of the adjacent low-k dielectric layer.
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申请公布号 |
US6475929(B1) |
申请公布日期 |
2002.11.05 |
申请号 |
US20010774708 |
申请日期 |
2001.02.01 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
GABRIEL CALVIN T.;PANGRLE SUZETTE K.;OKADA LYNNE A.;WANG FEI |
分类号 |
H01L21/768;H01L23/522;H01L23/532;(IPC1-7):H01L23/58 |
主分类号 |
H01L21/768 |
代理机构 |
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代理人 |
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地址 |
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