| 摘要 |
PROBLEM TO BE SOLVED: To prevent the generation of deformation on an original edition due to adhesion of foreign substances to an original edition holding part and a difference in flatness between the original edition surface and an original edition holding surface, and to realize exposing without deforming the original edition. SOLUTION: A pattern that is drawn on the reticle surface of a reticle 6 held on a reticle stage 2 is projected and transferred to a wafer held on a wafer stage through a reduction projection lens. The projection exposure apparatus having such a function is provided with a Z positioning pin chuck 7B as a first original edition holding means wherein the original edition holding surface is provided to hold and position the reticle 6, and a thin plate elastic chuck 7A as a second original edition holding means that is independently supported in movable or deformable state to the original edition surface of the first original edition holding means. COPYRIGHT: (C)2005,JPO&NCIPI |
