| 摘要 |
PROBLEM TO BE SOLVED: To provide a photomask and a pellicle to minimize deterioration in the transmittance inside a pellicle frame when the inner space of the pellicle frame of a photomask with the pellicle is replaced by oxygenated gas in photolithography using vacuum ultraviolet (UV) rays such as F2 laser lithography. SOLUTION: A pellicle frame 1(B) is stacked on a mask substrate (A), a pellicle 1(C) is stacked on the pellicle frame 1 (B), a pellicle frame 2(D) is stacked on the pellicle 1(C), and a pellicle 2(E) is tacked on the pellicle frame 2(D). Helium gas is supplied through an aeration port 1(F), while oxygenated helium gas is supplied through an aeration port 2(G). COPYRIGHT: (C)2005,JPO&NCIPI |
