发明名称 SEMICONDUCTOR DEVICE, TELEVISION SET, AND METHOD FOR MANUFACTURING THE SAME
摘要 <p>An object of the invention is to provide a method for manufacturing a substrate having a film pattern such as an insulating film, a semiconductor film, or a conductive film with an easy process, and further, a semiconductor device and a television set having a high throughput or a high yield at low cost and a manufacturing method thereof. One feature of the invention is that a first film pattern is formed by a droplet discharge method, a photosensitive material is discharged or applied to the first film pattern, a mask pattern is formed by irradiating a region where the first film pattern and the photosensitive material are overlapped with a laser beam and by developing, and a second film pattern having a desired shape is formed by etching the first film pattern using the mask pattern as a mask.</p>
申请公布号 WO2005071756(A1) 申请公布日期 2005.08.04
申请号 WO2005JP01280 申请日期 2005.01.24
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD.;YAMAZAKI, SHUNPEI;SHOJI, HIRONOBU;ARAI, YASUYUKI 发明人 YAMAZAKI, SHUNPEI;SHOJI, HIRONOBU
分类号 G02F1/1362;H01L21/336;H01L21/77;H01L21/84;H01L29/417;(IPC1-7):H01L29/786 主分类号 G02F1/1362
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