发明名称 Planar semiconductor structure e.g. ion sensitive field effect transistor structure, has chemically active, geometrically and spatially very small areas i.e. nano-spots, that are embedded in chemically inactive surface
摘要 <p>The structure has passivated contacts and a chemically inert surface, which is in direct contact for a surrounding medium (14) such as fluid or gas. Chemically active, geometrically and spatially very small areas i.e. nano-spots (12), are embedded in a chemically inactive surface. The chemically inert surface includes a potential window for elimination of water electrolysis. The chemically inert surface is highly temperature stable in a gaseous phase.</p>
申请公布号 DE102006007910(A1) 申请公布日期 2007.08.30
申请号 DE20061007910 申请日期 2006.02.19
申请人 UNIVERSITAET ULM 发明人 KOHN, ERHARD;DENISENKO, ANDREJ;HERNANDEZ-GUILLEN, FRANISCO
分类号 G01N27/414 主分类号 G01N27/414
代理机构 代理人
主权项
地址