发明名称 |
Planar semiconductor structure e.g. ion sensitive field effect transistor structure, has chemically active, geometrically and spatially very small areas i.e. nano-spots, that are embedded in chemically inactive surface |
摘要 |
<p>The structure has passivated contacts and a chemically inert surface, which is in direct contact for a surrounding medium (14) such as fluid or gas. Chemically active, geometrically and spatially very small areas i.e. nano-spots (12), are embedded in a chemically inactive surface. The chemically inert surface includes a potential window for elimination of water electrolysis. The chemically inert surface is highly temperature stable in a gaseous phase.</p> |
申请公布号 |
DE102006007910(A1) |
申请公布日期 |
2007.08.30 |
申请号 |
DE20061007910 |
申请日期 |
2006.02.19 |
申请人 |
UNIVERSITAET ULM |
发明人 |
KOHN, ERHARD;DENISENKO, ANDREJ;HERNANDEZ-GUILLEN, FRANISCO |
分类号 |
G01N27/414 |
主分类号 |
G01N27/414 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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