| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a compound suitable as an acid generator for resist compositions, an acid generator comprising the compound and a resist composition containing the acid generator and provide a method for forming resist patterns. <P>SOLUTION: The compound is expressed by general formula (b1-3). The resist composition comprises a base component (A) whose alkali solubility changes depending on the action of an acid and an acid generator component (B) which generates the acid upon exposure to light. The acid generator component (B) contains the acid generator (B1) comprising the compound expressed by general formula (b1-3). In the formula, R<SP>41</SP>, R<SP>42</SP>and R<SP>43</SP>express each independently an alkyl, an acetyl, an alkoxy, a carboxy or a hydroxyalkyl; n<SB>1</SB>expresses 0-3 integer; n<SB>2</SB>expresses 0-3 integer; n<SB>3</SB>expresses 0-2 integer, wherein n<SB>1</SB>, n<SB>2</SB>and n<SB>3</SB>do not simultaneously express 0; X<SP>-</SP>expresses an anion. <P>COPYRIGHT: (C)2008,JPO&INPIT |
