发明名称 LITHOGRAPHIC APPARATUS WITH ROTATION FILTER DEVICE
摘要 <p>A lithographic apparatus (1) including a filter device (149) is disclosed. The filter device (149) has a plurality of foils (200) attached to a holder (201) which is able to rotate around a rotation axis (RA). The foils (200) are arranged substantially parallel to the rotation axis (RA). The foils (200) comprise a uni-directional carbon- fiber composite material selected from the group consisting of carbon-carbon composite (C-C composite) and carbon-silicon carbide composite (C-SiC composite). During operation, the filter device (149) rotates and filters out debris from a radiation source (SO), such as a Sn plasma source. Such a filter device (149) per se may be provided.</p>
申请公布号 WO2009035328(A1) 申请公布日期 2009.03.19
申请号 WO2008NL50598 申请日期 2008.09.12
申请人 ASML NETHERLANDS B.V.;BUIS, EDWIN JOHAN;VAN EMPEL, TJARKO ADRIAAN RUDOLF 发明人 BUIS, EDWIN JOHAN;VAN EMPEL, TJARKO ADRIAAN RUDOLF
分类号 G03F7/20;C04B35/83;G21K1/00 主分类号 G03F7/20
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