发明名称 |
LITHOGRAPHIC APPARATUS WITH ROTATION FILTER DEVICE |
摘要 |
<p>A lithographic apparatus (1) including a filter device (149) is disclosed. The filter device (149) has a plurality of foils (200) attached to a holder (201) which is able to rotate around a rotation axis (RA). The foils (200) are arranged substantially parallel to the rotation axis (RA). The foils (200) comprise a uni-directional carbon- fiber composite material selected from the group consisting of carbon-carbon composite (C-C composite) and carbon-silicon carbide composite (C-SiC composite). During operation, the filter device (149) rotates and filters out debris from a radiation source (SO), such as a Sn plasma source. Such a filter device (149) per se may be provided.</p> |
申请公布号 |
WO2009035328(A1) |
申请公布日期 |
2009.03.19 |
申请号 |
WO2008NL50598 |
申请日期 |
2008.09.12 |
申请人 |
ASML NETHERLANDS B.V.;BUIS, EDWIN JOHAN;VAN EMPEL, TJARKO ADRIAAN RUDOLF |
发明人 |
BUIS, EDWIN JOHAN;VAN EMPEL, TJARKO ADRIAAN RUDOLF |
分类号 |
G03F7/20;C04B35/83;G21K1/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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