| 发明名称 | Photosensitive resin composition, method for manufacturing patterned cured film, and electronic component | ||
| 摘要 | There is provided a photosensitive resin composition containing (A) an alkali-soluble resin, (B) a compound which generates an acid when exposed to light, (C) a thermal crosslinking agent, and (D) a nitrogen-containing aromatic compound represented by the following formula (1):; wherein R1 represents a hydrogen atom or a hydrocarbon group; R2 represents a hydrogen atom, an amino group or a phenyl group; and A and B each independently represent a nitrogen atom, or a carbon atom and a hydrogen atom bonded thereto. | ||
| 申请公布号 | US9395626(B2) | 申请公布日期 | 2016.07.19 |
| 申请号 | US201214364498 | 申请日期 | 2012.10.31 |
| 申请人 | HITACHI CHEMICAL COMPANY, LTD. | 发明人 | Tanimoto Akitoshi;Nobe Shigeru;Kasuya Kei;Matsutani Hiroshi;Katogi Shigeki;Aoki Yu;Tahara Shingo |
| 分类号 | G03F7/00;G03F7/075;G03F7/004;G03F7/022;G03F7/023 | 主分类号 | G03F7/00 |
| 代理机构 | Griffin and Szipl PC | 代理人 | Griffin and Szipl PC |
| 主权项 | 1. A photosensitive resin composition, comprising: (A) an alkali-soluble resin; (B) a compound which generates an acid when exposed to light; (C) a thermal crosslinking agent; (D) an acryl resin; (E) a nitrogen-containing aromatic compound represented by the following formula (1), wherein R1 represents a hydrogen atom or a hydrocarbon group; R2 represents a hydrogen atom, an amino group or a phenyl group; and A and B each independently represent a nitrogen atom, or a carbon atom and a hydrogen atom bonded thereto. | ||
| 地址 | Tokyo JP | ||