发明名称 |
Mask and method of fabricating spacers |
摘要 |
A mask and a method of fabricating spacers (2) using the mask (1). The mask (1) comprises a light transmitting region including an array of light transmitting holes (230), a light non-transmitting region and a phase shifting layer (240) formed in one of two adjacent light transmitting holes (230) of the mask for shifting phrase of lights passing through the light transmitting holes (230). Thus, a light intensity can be reduced or lowered to zero when the lights pass through a diffractive region of the two adjacent light transmitting holes (230). Therefore, a bridging effect between two adjacent spacers (2) is alleviated and even avoided during fabricating the spacers (2). |
申请公布号 |
US9395582(B2) |
申请公布日期 |
2016.07.19 |
申请号 |
US201414416430 |
申请日期 |
2014.05.26 |
申请人 |
BOE Technology Group Co., Ltd.;Beijing BOE Optoelectronics Technology Co., Ltd. |
发明人 |
Chen Xiaochuan;Xue Hailin;Che Chuncheng;Jiang Wenbo;Li Yue |
分类号 |
G02F1/1339;G02B5/30;G03F7/20;G03F1/26;G02B5/00 |
主分类号 |
G02F1/1339 |
代理机构 |
Collard & Roe, P.C. |
代理人 |
Collard & Roe, P.C. |
主权项 |
1. A method of fabricating spacers, comprising:
forming a spacer material film on a substrate; irradiating the spacer material film in a region where a spacer array is to be formed, by using a mask, so that the spacer material film in the region is cured to form a pattern of the spacer array, the mask comprising a light transmitting region including an array of light transmitting holes corresponding to the region of the spacer array, a light non-transmitting region; and a phase shifting layer formed in one of two adjacent light transmitting holes of the mask for shifting phrase of lights passing through the light transmitting hole; and removing the uncured spacer material. |
地址 |
Beijing CN |