发明名称 Mask and method of fabricating spacers
摘要 A mask and a method of fabricating spacers (2) using the mask (1). The mask (1) comprises a light transmitting region including an array of light transmitting holes (230), a light non-transmitting region and a phase shifting layer (240) formed in one of two adjacent light transmitting holes (230) of the mask for shifting phrase of lights passing through the light transmitting holes (230). Thus, a light intensity can be reduced or lowered to zero when the lights pass through a diffractive region of the two adjacent light transmitting holes (230). Therefore, a bridging effect between two adjacent spacers (2) is alleviated and even avoided during fabricating the spacers (2).
申请公布号 US9395582(B2) 申请公布日期 2016.07.19
申请号 US201414416430 申请日期 2014.05.26
申请人 BOE Technology Group Co., Ltd.;Beijing BOE Optoelectronics Technology Co., Ltd. 发明人 Chen Xiaochuan;Xue Hailin;Che Chuncheng;Jiang Wenbo;Li Yue
分类号 G02F1/1339;G02B5/30;G03F7/20;G03F1/26;G02B5/00 主分类号 G02F1/1339
代理机构 Collard & Roe, P.C. 代理人 Collard & Roe, P.C.
主权项 1. A method of fabricating spacers, comprising: forming a spacer material film on a substrate; irradiating the spacer material film in a region where a spacer array is to be formed, by using a mask, so that the spacer material film in the region is cured to form a pattern of the spacer array, the mask comprising a light transmitting region including an array of light transmitting holes corresponding to the region of the spacer array, a light non-transmitting region; and a phase shifting layer formed in one of two adjacent light transmitting holes of the mask for shifting phrase of lights passing through the light transmitting hole; and removing the uncured spacer material.
地址 Beijing CN