| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target excellent in crack resistance, and a production method thereof, concerning a Mn-Zn-W-O-based sputtering target.SOLUTION: In a Mn-Zn-W-O-based sputtering target containing Mn, Zn, W and O as a component composition, in X-ray diffraction of the sputtering target, the ratio P/Pof the maximum peak intensity Pof a peak resulting from manganese oxide constituted only of Mn and O to the maximum peak intensity Pof a peak resulting from W is 0.027 or less.SELECTED DRAWING: Figure 2 |
