| 发明名称 | Jet ink and ink jet printing process | ||
| 摘要 | An ink jet-printable composition, which comprises a compound having a reactive silyl group and which is suitable for printing on non-porous substrates such as a glass or ceramic, and a process of decorating non-porous substrates involving ink jet printing the composition onto the substrate, exposing the printed composition to actinic or electron beam radiation to initiate curing and heating the printed composition to a temperature of at least 100° C. | ||
| 申请公布号 | US9421807(B2) | 申请公布日期 | 2016.08.23 |
| 申请号 | US200912920467 | 申请日期 | 2009.03.02 |
| 申请人 | Sun Chemical B.V. | 发明人 | Grant Alexander;Moncur Samuel Thomas;Caiger Nigel Anthony |
| 分类号 | B41M5/00;C09D11/101;B41M7/00 | 主分类号 | B41M5/00 |
| 代理机构 | Ostrolenk Faber LLP | 代理人 | Achkar Charles C.;Ostrolenk Faber LLP |
| 主权项 | 1. A process of decorating a glass or ceramic substrate, comprising: a) ink jet printing a curable composition comprising (i) a compound having a reactive silyl group; (ii) a polymerizable monomer that does not include a reactive silyl group; and iii) an acidic component having an acid value of 50 to 300 mg KOH/g onto a substrate; b) exposing the printed composition on the substrate to electron beam or actinic radiation to initiate curing; and c) heating the exposed composition on the substrate to a temperature of 100° C. to 400° C. to provide a printed and cured ink; wherein the printed and cured ink is resistant to removal from the substrate by exposure to alkali; and wherein resistance to removal by exposure to alkali means that the printed and cured ink is not removed with greater than 100 alkali rubs. | ||
| 地址 | Weesp NL | ||