发明名称 BONDING WIRE FOR SEMICONDUCTOR DEVICE
摘要 Provided is a bonding wire for a semiconductor device, said bonding wire having a Cu alloy core and a Pd coating layer formed on the surface of the Cu alloy core, and being characterized by including an element that imparts connection reliability in a high-temperature environment, wherein the proof stress ratio, as defined by formula (1), is 1.1-1.6. (1) Proof stress ratio = maximum proof stress / 0.2% proof stress.
申请公布号 WO2016204138(A1) 申请公布日期 2016.12.22
申请号 WO2016JP67624 申请日期 2016.06.14
申请人 NIPPON MICROMETAL CORPORATION;NIPPON STEEL & SUMIKIN MATERIALS CO., LTD. 发明人 YAMADA, Takashi;ODA, Daizo;HAIBARA, Teruo;OISHI, Ryo;SAITO, Kazuyuki;UNO, Tomohiro
分类号 H01L21/60 主分类号 H01L21/60
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