发明名称 |
Bifilar, helical electrode arrangement for relatively high gas pressures |
摘要 |
The invention relates to a bifilar, helical electrode arrangement for pulsed, transversally excited gas lasers. With its aid, gaseous laser media can be excited at relatively high gas pressures than is possible using known arrangements. The bifilar, helical electrode arrangement for relatively high gas pressures consists of a helical anode, a helical cathode, capacitors which are connected between the two helical electrode structures, and a number of distributed spark paths, which are placed in the discharge region, via which the capacitors are charged up. <IMAGE>
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申请公布号 |
DE3222200(A1) |
申请公布日期 |
1983.12.15 |
申请号 |
DE19823222200 |
申请日期 |
1982.06.12 |
申请人 |
KRAHN,KARL-HEINZ,DIPL.-PHYS.DR.-ING. |
发明人 |
KRAHN,KARL-HEINZ,DIPL.-PHYS.DR.-ING. |
分类号 |
H01S3/038;H01S3/0971;(IPC1-7):H01S3/09 |
主分类号 |
H01S3/038 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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