EXPOSURE, MASK, EXPOSURE MASK SUBSTRATE AND ITS PRODUCTION

摘要

PURPOSE:To provide a highly accurate exposure mask and its production by which plural semitransparent films can be easily formed without defects or deposition of dust and the production process can be simplified. CONSTITUTION:This exposure mask has a mask pattern formed on a light- transmitting substrate. The mask pattern contains a semitransparent film pattern in which the optical length for the exposure light differs from that in the transparent part of the light-transmitting substrate 10 by a specified amount. This semitransparent film pattern consists of laminated layers of a Si layer 11 and a Si2N4 layer 12, each having the optimum film thickness. These layers contain the same element (Si) but have different compsn.