发明名称 CRYSTAL GROWING METHOD AND CRYSTAL GROWING APPARATUS
摘要 A crystal growing apparatus comprises a solid-state device (42) having a region (42a) where valence electrons are so controlled that the density of holes or electrons in the surface portion is controlled according to the environment of a solution (43) containing a polymer compound, a pair of opposed electrodes (44a, 44b) on both sides of the space above the region (42a), and electrical insulating members (46a, 46b) supporting the electrode s (44a, 44b). The region (42a) is an impurity region formed on a silicon semiconductor substrate. A crystal growing method comprises applying an electric field to a solution (43) through opposed electrodes (44a, 44b). A crystal of a polymer compound is grown in the solution (43) in the electric field in an electric state given to the surface of a region (42a).
申请公布号 CA2340628(A1) 申请公布日期 2000.02.24
申请号 CA19992340628 申请日期 1999.08.11
申请人 SUMITOMO METAL INDUSTRIES, LTD. 发明人 SANJOH, AKIRA
分类号 C08J3/00;B01D9/02;C30B7/00;C30B29/58 主分类号 C08J3/00
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