发明名称 METHOD FOR MANUFACTURING SOLAR CELL
摘要 <p>PROBLEM TO BE SOLVED: To inexpensively manufacture a p-n junction-type solar cell with high optoelectric conversion efficiency, using a crystal system semiconductor by reducing the number of the manufacturing processes. SOLUTION: A diffusion film 11 containing impurity is formed on the surface of the non-electrode part of a crystal system semiconductor (semiconductor substrate 1), then the semiconductor is subjected to thermal diffusion in an atmosphere of diffusion gas containing the impurity after forming the film 11, a lightly-doped layer (n+ layer 2a) based on the diffusion film of the impurity from the film 11 is formed at a non-electrode part, and at the same time, a heavily-doped layer (n++ layer 2b) based on the diffusion of the impurity from the diffusion gas is formed at an electrode part.</p>
申请公布号 JP2000183379(A) 申请公布日期 2000.06.30
申请号 JP19980352383 申请日期 1998.12.11
申请人 SANYO ELECTRIC CO LTD 发明人 YAMANISHI TSUTOMU;TSUGE TEIJI
分类号 H01L21/22;H01L21/225;H01L31/04;(IPC1-7):H01L31/04 主分类号 H01L21/22
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