| 摘要 |
A method for transferring a substrate (R), comprising the steps of storing the substrate (R) in a space supplied with a specified gas, providing a specified force to the foreign matter adhered to the surface of the substrate (R) or the foreign matter near the surface of the substrate (R), separating the foreign matter from the surface of the substrate (R), and discharging the foreign matter separated from the surface of the substrate (R) to the outside of the space together with the specified gas, whereby minute foreign matter is prevented from adhering to the substrate (R) and the substrate during the transfer can be kept in clean state. |
