| 摘要 |
A sputtering cathode with a target going around an axis and a number of permanent magnets arranged around the axis. The permanent magnets provide tunnel-forming and substantially radially directed magnetic fields adjacent the surface of the target to be sputtered. Also present is an electromagnet with a yoke having a first and a second pole for generating an axially directed magnetic field along the axis. The first pole is situated closer to the axis than the electromagnet and the second pole is situated further from the axis than the electromagnet. A magnetic shunt is arranged in axial direction between the electromagnet and the target and in radial direction between the axis and the second pole. |
