| 摘要 |
An exposing apparatus is provided to widen bandwidth without deteriorating lithography resolution, or perform exposure in a high lithography resolution state. An exposing apparatus includes a digital micromirror device(DMD), an imaging optical system(50) having a projection part, and a pattern-forming part(70). The projection part has a first direction cylindrical lens which concentrates an intermediate projection image in a first direction(x) forming a predetermined tilt angle relative to a main scanning direction(xx), and a side scanning direction cylindrical lens group which divides and concentrates the intermediate projection image in a side scanning direction(yy) forming the predetermined tilt angle between the first direction(x) and a second direction(y) vertical to the first direction, or a second direction cylindrical lens group which divides and concentrates the intermediate projection image in the second direction(y). The intermediate projection image is formed by lights reflected from an on-state micromirror in the DMD. The pattern-forming part moves in the main scanning direction when the projection image is projected through the imaging optical system from the DMD upon exposure. |
