发明名称 Elimination of dendrite formation during metal/chalcogenide glass deposition
摘要 A method of forming a programmable conductor memory cell array is disclosed wherein metal and chalcogenide glass are co-sputtered to fill an array of cell vias in a prepared substrate. The prepared substrate is heated above room temperature before the metal and chalcogenide glass film is deposited, and the heating is maintained throughout the deposition. The resulting metal/chalcogenide glass film has good homogeneity, a desired ratio of components, and has a regular surface.
申请公布号 US2004082099(A1) 申请公布日期 2004.04.29
申请号 US20030602483 申请日期 2003.06.24
申请人 MICRON TECHNOLOGY, INC. 发明人 LIN JIUTAO;MCTEER ALLEN
分类号 C23C14/06;C23C14/54;H01L45/00;(IPC1-7):H01L21/06;H01L21/44 主分类号 C23C14/06
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