| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device advantageous for suppressing occurrence of misalignment of the exposure position on the periphery of a substrate, by a simple configuration.SOLUTION: An exposure device 100 for exposing the periphery of a substrate W includes: an optical system 18 for irradiating the substrate W with exposure light; a stage S moving in a direction perpendicular to the optical axis of the optical system 18 while holding the substrate W; and a control unit 20 for controlling the movement operation of the stage S. The control unit 20 moves the stage S so that a predetermined position on the substrate W is irradiated with the exposure light from the optical system 18, on the basis of distance information d between the optical system 18 and the peripheral part of the substrate W in a direction parallel with the optical axis of the optical system 18, and a telecentric degree φ of the optical system 18.SELECTED DRAWING: Figure 2 |
