Semiconductor device and manufacturing method thereof

摘要

A means of forming unevenness for preventing specular reflection of a pixel electrode, without increasing the number of process steps, is provided. In a method of manufacturing a reflecting type liquid crystal display device, the formation of unevenness (having a radius of curvature r in a convex portion) in the surface of a pixel electrode is performed by the same photomask as that used for forming a channel etch type TFT, in which the convex portion is formed in order to provide unevenness to the surface of the pixel electrode and give light scattering characteristics.

主权项

1. A semiconductor device comprising:
a first conductive film on a substrate; an IC chip whose first electrode is connected to the first conductive film through a conductive particle; a second conductive film connected to a second electrode of the IC chip through a conductive particle; and an FPC connected to the second conductive film through a conductive particle, wherein the first conductive film comprises a region overlapping with a sealing material.