| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing method which allows for predetermined patterning on a substrate appropriately, in the substrate processing where a block-copolymer containing a hydrophilic polymer and a hydrophobic polymer is used.SOLUTION: A plurality of circular patterns are formed on a wafer W by a polystyrene film 404, followed by application of a block-copolymer on the wafer W. The block-copolymer is subjected to phase separation into hydrophilic polymer 411 and hydrophobic polymer 412. The ratio of molecular weight of the hydrophilic polymer 411 is adjusted so that the hydrophilic polymer 411 is arranged at the position corresponding to the hexagonal close-packed structure, and the diameter of a circular pattern by the polystyrene film 404 is set to 2(L-R) or less, where Lis the pitch of the hydrophilic polymer 411, and R is the radius of the hydrophilic polymer 411.SELECTED DRAWING: Figure 12 |
