Lithographic apparatus and device manufacturing method

摘要

A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

主权项

1. A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate using a projection system, the apparatus comprising:
a liquid supply system arranged to supply a liquid to a space between the projection system and a movable table; a member to at least partly confine liquid in the space, the member comprising a recovery opening facing toward the movable table, the recovery opening comprising a porous member configured to recover liquid and having a shape, comprising a plurality of sides, around a path, in the space, along which the pattern is projected; and an extraction outlet, outward relative to the space, of the recovery opening, the extraction outlet configured to exhaust a fluid.