Electrostatic chuck and plasma apparatus equipped therewith

摘要

An electrostatic chuck having an electrostatic holding member arranged on an upper surface of the chuck main body for holding a semiconductor device during a plasma etching process. The electrostatic holding member includes a pair of insulating polyimide members and a conductive member interposed between the polyimide members. In operation, a voltage is applied to the first conductive member in order to generate static electricity to be applied to the electrostatic holding member for holding the semiconductor device.