发明名称 |
Dry process coating method and apparatus therefor. |
摘要 |
<p>A continuous dry coating method and an apparatus therefor which are capable of removing cut chips and burrs from and smoothing inner walls of small-diameter holes in a substrate material and, then, successively performing a cold coating on these small holes in a short period of time. The continuous dry process coating method comprises the steps of: arranging electrodes on both sides of a substrate material; performing a plasma discharge to surface-treat small holes made in the substrate material; and then performing an electron cyclotron resonance plasma (ECR plasma) coating on the surfaces of these holes. <IMAGE></p> |
申请公布号 |
EP0574178(A2) |
申请公布日期 |
1993.12.15 |
申请号 |
EP19930304290 |
申请日期 |
1993.06.03 |
申请人 |
OHBA, KAZUO;SHIMA, YOSHINORI;OHBA, AKIRA;SAKAE ELECTRONICS INDUSTRIAL CO., LTD. |
发明人 |
OHBA, KAZUO;SHIMA, YOSHINORI;OHBA, AKIRA |
分类号 |
C23C16/50;C23C16/02;C23C16/04;C23C16/511;C23C16/515;C23C16/54;H01J37/32;H01L21/31;H05K3/40;(IPC1-7):C23C16/54 |
主分类号 |
C23C16/50 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|