| 摘要 |
PROBLEM TO BE SOLVED: To excellently introduce abrasive grain between a glass substrate and a polishing pad even in a state that permeation of abrasive grain is promoted within a polishing pad, abrasive grain is supplied from the inside of the polishing pad and polishing load is increased by forming the polishing pad out of unwove fabric and improve a polishing rate. SOLUTION: Polishing pads 2 are joined to each of opposed surfaces of a pair of rotating surface plates 1A, 1B. A planar work W is polished, while supplying abrasive grain by holding a part of the work W between both of the polishing pads 2 from both surfaces. When unwoven fabric is used as the polishing pads 2, a polishing rate of about 6.2 μm/min is realized by the number of revolution of the surfaces plates 1A, 1B of about 600 rpm, and when the number of revolution of the surfaces plates 1A, 1B is made about 1000 rpm, the polishing rate is attained to about 9.6 μm/min. Further, when abrasive concentration is changed to about 67 wt.%, the polishing rate is improved to about 11.3 μm/min. As unwoven fabric, various kinds of fabric of a wide range can be used, and when abrasive concentration is made 50 wt.% or more, a remarkable effect can be obtained. |
