发明名称 Apparatus and method of vacuum metallic sintering for a semiconductor
摘要 An apparatus and method of vacuum metallic sintering for a semiconductor uses a quartz tube, a vacuum air-extracting apparatus, a furnace and a gas injection pipe. The metal sintered does not produce metal oxide in a vacuum established by the vacuum air-extracting apparatus. After sintering, a movable furnace can withdraw from the quartz tube immediately to decrease cooling time.
申请公布号 US2006219167(A1) 申请公布日期 2006.10.05
申请号 US20050094279 申请日期 2005.03.31
申请人 LITE-ON SEMICONDUCTOR CORP. 发明人 CHENG HUNG-LUNG;WU HUI-CHUNG;LEE CHI-CHEN
分类号 H01L21/22 主分类号 H01L21/22
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