发明名称 Negative radiation-sensitive resin composition
摘要 It is an object of the present invention to provide a process capable of precisely producing a plated shaped article of a large thickness such as a bump or a wiring, a negative radiation-sensitive resin composition which is preferably used for the process and has excellent sensitivity and resolution, and a transfer film using the composition. The above object is achieved by a negative radiation-sensitive resin composition comprising (A) a polymer containing structural units represented by the following formula (1) and/or the following formula (2), (B) a compound having at least one ethylenically unsaturated double bond and (C) a radiation-sensitive radical polymerization initiator, and by forming a negative radiation-sensitive resin film using the composition.
申请公布号 US7482111(B2) 申请公布日期 2009.01.27
申请号 US20050593972 申请日期 2005.03.24
申请人 JSR CORPORATION 发明人 NISHIKAWA KOUJI;KIMURA TOORU;IWANAGA SHIN-ICHIRO
分类号 G03F7/40;C08F20/18;C08F20/58;G03F7/004;G03F7/033;G03F7/037;H01L21/027 主分类号 G03F7/40
代理机构 代理人
主权项
地址