发明名称 RESIN COMPOSITION FOR ENCAPSULATING A SEMICONDUCTOR ELEMENT AND A SEMICONDUCTOR DEVICE
摘要 The purposes of the present invention is to provide a resin composition which provides a cured product which has a high glass transition temperature, a low moisture absorption and a good solder reflow property and small heat decomposition in storage at a high temperature for a long time, and has good moldability and good adhesiveness to a Cu lead frame. Thus, the present invention is to provide a composition comprising (A) an epoxy compound represented by the general formula (1); (B) a copolymer obtained by a hydrosilylation between an alkenyl group-containing epoxy compound and an organopolysiloxane represented by the average compositional formula (2); (C) a phenol compound represented by the general formula (3); (D) an inorganic filler; (E) at least one compound selected from the group consisting of organic phosphines, tetra-substituted phosphonium tetraphenylborates and adducts of phosphines and quinones; and (F) a nitrogen-containing heterocyclic compound represented by the formula (I) or a salt thereof represented by the formula (II). Further, the present invention provides a semiconductor device provided with a cured product obtained by curing the composition.
申请公布号 US2016251511(A1) 申请公布日期 2016.09.01
申请号 US201615053730 申请日期 2016.02.25
申请人 Shin-Etsu Chemical Co., Ltd. 发明人 OSADA Shoichi;YOKOTA Ryuhei;OISHI Hiroki;IKEDA Tadaharu
分类号 C08L63/00;H01L23/29 主分类号 C08L63/00
代理机构 代理人
主权项 1. A composition comprising the following components (A) to (F): (A) an epoxy compound represented by the following general formula (1):wherein R1, R2 and R3 are, independently of each other, a hydrogen atom or a substituted or unsubstituted, alkyl, aryl or aralkyl group having 1 to 10 carbon atoms, m1, m2, m3 are, independently of each other, an integer of 1 or 2, provided that a percentage of a total number of m1, m2 and m3 which are integer of 2 is 20 to 100%, relative to a total number of m1, m2 and m3, l1 is 5 minus m1, l3 is 5 minus m3, l2 is 4 minus m2; and n is an integer of from 0 to 15, (B) a copolymer obtained by a hydrosilylation between an alkenyl group-containing epoxy compound and an organopolysiloxane represented by the following average compositional formula (2), in an amount of 2 to 20 parts by mass, relative to total 100 parts by mass of components (A), (B) and (C),HaRbSiO4-(a+b)2(2)wherein R is, independently of each other, a substituted or unsubstituted, monovalent hydrocarbon group having 1 to 10 carbon atoms, a is a positive number of from 0.01 to 1, and b is a positive number of from 1 to 3, provided that a total value of a and b is from 1.01 to less than 4, (C) a phenol compound represented by the following general formula (3), in an amount of 20 to 50 parts by mass, relative to total 100 parts by mass of components (A), (B) and (C),wherein R4, R5 and R6 are, independently of each other, a hydrogen atom or a substituted or unsubstituted, alkyl, aryl or aralkyl group having 1 to 10 carbon atoms, p1, p2 and p3 are, independently of each other, an integer of 1 or 2, provided that a percentage of a total number of p1, p2 and p3 which are an integer of 2 is 20 to 100%, relative to a total number of p1, p2 and p3, q1 is 5 minus p1, q3 is 5 minus p3, q2 is 4 minus p2; and n′ is an integer of from 0 to 15, (D) an inorganic filler in an amount of 150 to 1500 parts by mass, relative to total 100 parts by mass of components (A), (B) and (C), (E) at least one compound selected from the group consisting of organic phosphines, tetra-substituted phosphonium tetraphenylborates and adducts of phosphines and quinones, in an amount of 0.1 to 5 parts by mass, relative to total 100 parts by mass of components (A), (B) and (C), and (F) at least one selected from compounds represented by the following formula (I) and salts represented by the following formula (II), in an amount of 0.1 to 5 parts by mass, relative to total 100 parts by mass of components (A), (B) and (C),wherein d is an integer of from 1 to 3,wherein R″ is a hydrogen atom, an aliphatic hydrocarbon group having 1 to 6 carbon atoms or an aromatic hydrocarbon group having 6 to 10 carbon atoms, d is an integer of from 1 to 3, and X is an anion selected from the group consisting of a tetraphenylborate ion, a phenol ion, a phenol resin ion, a toluene sulphonate ion, a halide ion and a carboxylate ion having 1 to 10 carbon atoms.
地址 Tokyo JP