发明名称 THIN FILM EL ELEMENT AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an uniform and reliable thin film EL element and its manufacturing method without increasing its cost by restraining defects generated at a dielectric layer, especially, generation of cracks in burning the dielectric layer formed by a solution-coating burning method, and improving insulating pressure resistance. SOLUTION: With the thin film EL element which has at least a laminated structure with a light-emitting layer and transparent electrode layer after an electrode layer having a pattern is formed on a substrate having electric insulation and then, a dielectric layer is formed into a multi-layer state by repeating a solution-coating burning method, a buffer layer is placed between the multi- layer dielectric layer and the electrode layer.
申请公布号 JP2002158094(A) 申请公布日期 2002.05.31
申请号 JP20000351860 申请日期 2000.11.17
申请人 TDK CORP 发明人 SHIRAKAWA YUKIHIKO;UEMATSU KATSUYA;MIWA MASASHI
分类号 H05B33/22;H05B33/10;(IPC1-7):H05B33/22 主分类号 H05B33/22
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