METHOD FOR CRYSTALLIZING A SEMICONDUCTOR THIN FILM

摘要

A method for crystallizing a semiconductor thin film is provided to form a polycrystalline region on the semiconductor thin film by arranging regularly band-shaped crystal grains having good shape accuracy. A method for crystallizing a semiconductor thin film(3) includes a process for crystallizing the corresponding semiconductor thin film by scanning and irradiating continuously an energy beam on the semiconductor thin film at a predetermined speed. The energy beam is scanned in parallel lines by maintaining pitches equal to or less than an irradiation diameter of the energy beam so that band-shaped crystal grains are grown in a direction different from a scanning direction of the energy beam. The pitch for scanning the energy beam in parallel lines is equal to or less than the irradiation radius of the corresponding energy beam.