发明名称 STRUCTURE COMBINING AN IC INTEGRATED AND A CARRIER, AND METHOD OF MANUFACTURING SUCH STRUCTURE
摘要 The present invention provides a structure combining an IC integrated substrate and a carrier, which comprises a carrier and an IC integrated substrate formed on the carrier. The interface between the IC integrated substrate and the carrier has a specific area at which the interface adhesion is different from that at the remaining area of the interface. The present invention also provides a method of manufacturing the above structure and a method of manufacturing electronic devices using the above structure.
申请公布号 KR100785176(B1) 申请公布日期 2007.12.11
申请号 KR20060099911 申请日期 2006.10.13
申请人 发明人
分类号 H01L23/32 主分类号 H01L23/32
代理机构 代理人
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